发明名称 SEMICONDUCTOR COMPOSITE FILM WITH HETEROJUNCTION AND MANUFACTURING METHOD THEREOF
摘要 The present invention discloses a semiconductor composite film with a heterojunction and a manufacturing method thereof. The semiconductor composite film includes: a semiconductor substrate; and a semiconductor epitaxial layer, which is formed on the semiconductor substrate, and it has a first surface and a second surface opposite to each other, wherein the heterojunction is formed between the first surface and the semiconductor substrate, and wherein the semiconductor epitaxial layer further includes at least one recess, which is formed by etching the semiconductor epitaxial layer from the second surface toward the first surface. The recess is for mitigating a strain in the semiconductor composite film.
申请公布号 US2016099320(A1) 申请公布日期 2016.04.07
申请号 US201514966818 申请日期 2015.12.11
申请人 Su Hung-Der;Chiu Chien-Wei;Huang Tsung-Yi 发明人 Su Hung-Der;Chiu Chien-Wei;Huang Tsung-Yi
分类号 H01L29/205;H01L21/02;H01L21/306;H01L29/20 主分类号 H01L29/205
代理机构 代理人
主权项
地址 Pingzhen City TW