| 主权项 |
1. A method of controlling a substrate inspection apparatus, wherein the substrate inspection apparatus includes a stage configured to mount a substrate thereon and a camera configured to photograph the stage, and wherein the stage moves in a first moving direction in a horizontal plane and a second moving direction perpendicular to the first moving direction in the horizontal plane, the camera is arranged to face the horizontal plane, a coordinate system of an image photographed by the camera is defined by an X axis and a Y axis perpendicular to each other in the horizontal plane, the X axis corresponds to the first moving direction, the Y axis corresponds to the second moving direction, the camera photographs a target indicating a position of the stage, and an alignment of the stage is performed based on a position of the photographed target in the coordinate system of the image photographed by the camera, the method comprising:
calculating in each quadrant divided by the X axis and the Y axis, a deviation of the X axis in a rotational direction with respect to the first moving direction or a deviation of the Y axis in the rotational direction with respect to the second moving direction; correcting the position of the photographed target in the coordinate system of the image photographed by the camera based on the calculated deviation in the rotational direction; and performing an alignment of the stage based on the corrected position of the target. |
