PREPARATION METHOD OF PATTERENED SUBSTRATE

摘要

The present disclosure relates to a manufacturing method of a patterned substrate. According to the present invention, for example, the method is applied to a manufacturing process of a device such as an electronic device and an integrated circuit or another purpose including an integrated optical system, guidance and a detecting pattern of a magnetic domain memory, a flat panel display, a liquid crystal display (LCD), a thin film magnetic head, an inorganic light emitting diode, or so forth. In addition, the method is able to be utilized to form a pattern on a surface to manufacture a discrete track medium such as an integrated circuit, a bit-patterned medium, a magnetic storage device like a hard drive, and/or so forth. The method comprises a step of forming a polymer layer including a block copolymer.