TOP LAMP MODULE FOR CAROUSEL DEPOSITION CHAMBER

摘要

A heating module for use in a substrate processing chamber. The heating module having a housing with a heat source therein. The heating module can be part of a gas distribution assembly positioned above a susceptor assembly to heat the top surface of the susceptor and wafers directly. The heating module can have constant or variable power output. Processing chambers and methods of processing a wafer using the heating module are described.

主权项

1. A processing chamber comprising:
a circular gas distribution assembly positioned within the processing chamber, the gas distribution assembly comprising a plurality of elongate gas ports in a front face of the gas distribution assembly, the plurality of elongate gas ports extending at least from an inner diameter region to an outer diameter region of the gas distribution assembly, the plurality of gas ports comprising a reactive gas port to deliver a reactive gas to the processing chamber, a purge gas port to deliver a purge gas to the processing chamber and a vacuum port to evacuate gases from the processing chamber; a heating module comprising a heat source, the heating module within the circular gas distribution assembly and having a wedge shape and the heat source comprises one or more of a lamp or a resistive heater; and a susceptor assembly within the processing chamber to rotate at least one substrate in a substantially circular path about a rotational axis, the susceptor assembly having a top surface defined by an inner peripheral edge and an outer peripheral edge, the susceptor assembly positioned below the gas distribution assembly so that the top surface of the susceptor assembly faces the front face of the gas distribution assembly.