发明名称 PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING CURED FILM, CURED FILM, LIQUID CRYSTAL DISPLAY DEVICE, ORGANIC ELECTROLUMINESCENT DISPLAY DEVICE, AND TOUCH PANEL
摘要 Provided are a photosensitive resin composition exhibiting favorable sensitivity and capable of forming a cured film having excellent solvent resistance, a method for producing a cured film, a cured film, a liquid crystal display device, an organic electroluminescent display device, and a touch panel. This photosensitive resin composition contains: a polysiloxane component; a photoacid generator for generating an acid having a pKa of 3 or less; and a solvent. The polysiloxane component contains: a polysiloxane (A1) having a constituent unit that represents at least 40 mol% of the total constituent units and has a group in which a carboxy group is protected by an acetal structure and/or a group in which a phenolic hydroxyl group is protected by an acetal structure; and a polysiloxane (A2) having a constituent unit having an epoxy group and/or an oxetanyl group, and a constituent unit having a carboxy group and/or a phenolic hydroxyl group. Therein, the mass ratio of the polysiloxane (A1) to the polysiloxane (A2) is 70:30-30:70.
申请公布号 WO2016052391(A1) 申请公布日期 2016.04.07
申请号 WO2015JP77289 申请日期 2015.09.28
申请人 FUJIFILM CORPORATION 发明人 ANDO TAKESHI
分类号 G03F7/075;G02F1/1333;G03F7/004;G03F7/039;G06F3/041;G06F3/044;H01L51/50;H05B33/22 主分类号 G03F7/075
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