| 摘要 |
The present disclosure pertains to a solid-state imaging element, production method, and electronic device that make it possible to diffuse a component at the interface of a microlens and an antireflective film. Moisture permeation openings are formed between the microlenses of adjacent pixels. The moisture permeation openings are covered in antireflective film. The antireflective film is formed on the surfaces of the microlenses, excluding diffusion openings. The refractive index of the antireflective film is higher than that of the microlenses. This disclosure can be applied, for example, to a complementary metal-oxide semiconductor (CMOS) image sensor that is a back-illuminated solid-state imaging element. |
