发明名称 真空蒸着方法、真空蒸着装置及び有機EL表示装置の製造方法
摘要 <P>PROBLEM TO BE SOLVED: To facilitate deposition of a high definition thin film pattern without using a shadow mask. <P>SOLUTION: The vacuum deposition method includes a step for charging the deposition molecules 23 of an organic EL material evaporated from an evaporation source 2 before reaching a substrate 5 for organic EL display, a step for electrifying a resistor 21 provided in contact electrically with the surface of a pixel electrode 14, located corresponding to a point where a luminous layer 16 is formed, on the substrate side by applying a voltage having a polarity different from the charging polarity of the charged deposition molecules 23 so that a temperature limited not to cause sublimation of the organic EL material occurs therein, and a step for electrifying a resistor 21 provided in contact electrically with the surface of a pixel electrode 14, located corresponding to a point where a luminous layer 16 is not formed, on the substrate side by applying a voltage having the same polarity as the charging polarity of the charged deposition molecules 23 so that a temperature sufficient for causing sublimation of the organic EL material occurs therein. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP5899584(B2) 申请公布日期 2016.04.06
申请号 JP20110176252 申请日期 2011.08.11
申请人 株式会社ブイ・テクノロジー 发明人 工藤 修二;木村 江梨子;水村 通伸;梶山 康一
分类号 H05B33/10;C23C14/04;C23C14/24;H01L51/50;H05B33/12 主分类号 H05B33/10
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