| 摘要 |
The invention relates to a novel method, device and computer program product for measuring wavefronts. Said method and device for measuring a wavefront comprise the production of a synthetic aperture wavefront sensor. In said method and device, the synthetic aperture wavefront sensor generates a synthetic sampling pattern which is obtained by combining at least two different sampling patterns. The method and device are used to measure wavefronts, to measure ocular aberrations, to characterise optical elements, to measure distances, to characterise surfaces, and for metrological purposes. |
