APPARATUS AND METHOD FOR FILM DEPOSITION

摘要

Provided are an apparatus and a method which are capable of manufacturing a thermoelectric device, requiring selective deposition by using aerosol deposition. A film deposition apparatus according to the present invention comprises: a process chamber which includes a stage transferring a target in a state of supporting the target; a vacuum pump which is connected and combined with the process chamber, and forms a vacuum; aerosol chambers which accommodate heterogeneous powders, respectively; a carrier gas container which stores carrier gas; carrier gas supply pipes each of which connects the carrier gas container and an interior of each of the aerosol chambers so as to introduce the carrier gas into the interior of each of the aerosol chambers; aerosol transfer pipes each of which guides aerosol, including the powder mixed with the carrier gas, from each of the aerosol chambers to an interior of the process chamber; and nozzles which are provided at respective ends of the aerosol transport pipes, and spray the aerosol onto the target.