| 发明名称 | Catoptric objectives and systems using catoptric objectives | ||
| 摘要 | In general, in one aspect, the invention features an objective arranged to image radiation from an object plane to an image plane, including a plurality of elements arranged to direct the radiation from the object plane to the image plane, wherein the objective has an image side numerical aperture of more than 0.55 and a maximum image side field dimension of more than 1 mm, and the objective is a catoptric objective. | ||
| 申请公布号 | US9304407(B2) | 申请公布日期 | 2016.04.05 |
| 申请号 | US201314104180 | 申请日期 | 2013.12.12 |
| 申请人 | Carl Zeiss SMT GmbH | 发明人 | Mann Hans-Juergen;Shafer David;Ulrich Wilhelm |
| 分类号 | G02B5/10;G03B27/54;G03F7/20;G02B13/14;G02B17/06 | 主分类号 | G02B5/10 |
| 代理机构 | Fish & Richardson P.C. | 代理人 | Fish & Richardson P.C. |
| 主权项 | 1. An apparatus, comprising: a projection objective configured to image radiation along a path from an object field of the projection objective to an image field of the projection objective, the projection objective having a demagnification ratio of more than 4×; and an illumination system configured to illuminate the object field of the projection objective, wherein the apparatus is a microlithography projection exposure apparatus. | ||
| 地址 | Oberkochen DE | ||