Resist composition and method for producing semiconductor device

摘要

A resist composition includes: a crosslinking material that is crosslinked in the presence of an acid; an acid amplifier; and a solvent.

主权项

1. A method for producing a semiconductor device, comprising:
forming a first resist pattern capable of supplying an acid, with a first resist composition, on a semiconductor substrate; forming a second resist layer by coating a second resist composition containing a crosslinking material that is crosslinked in the presence of an acid, an acid amplifier, an inclusion compound, and a solvent, on the first resist pattern, wherein the inclusion compound includes the acid amplifier; forming a crosslinked portion in the second resist layer by diffusing an acid from the first resist pattern into the second resist layer; and removing a portion of the second resist layer that is not crosslinked.