发明名称 |
Ion sensitive field effect transistor |
摘要 |
A CMOS or bipolar based Ion Sensitive Field Effect Transistor (ISFET) comprising an ion sensitive recess for holding a liquid wherein the recess is formed at least partly on top of a gate of the transistor. There is also provided a method of manufacturing an I on Sensitive Field Effect Transistor (ISFET) utilizing CMOS processing steps, the method comprising forming an ion sensitive recess for holding a liquid at least partly on top of a gate of the transistor. |
申请公布号 |
US9304104(B2) |
申请公布日期 |
2016.04.05 |
申请号 |
US201314072908 |
申请日期 |
2013.11.06 |
申请人 |
X-FAB SEMICONDUCTOR FOUNDRIES AG |
发明人 |
Koo Sang Sool;Fang Ling Gang |
分类号 |
G01N27/414 |
主分类号 |
G01N27/414 |
代理机构 |
Nixon & Vanderhye PC |
代理人 |
Nixon & Vanderhye PC |
主权项 |
1. A CMOS or bipolar based Ion Sensitive Field Effect Transistor (ISFET) comprising:
an ion sensitive recess for holding a liquid wherein the recess is formed at least partly on top of a gate of the transistor, a dielectric material over a semiconductor substrate comprising a drain and a source wherein the dielectric material is in contact with, or surrounds, the recess, and wherein the dielectric material further includes an inter-layer dielectric on top of the substrate, the inter-layer dielectric at least partially covering the gate. |
地址 |
Erfurt DE |