发明名称 Ion sensitive field effect transistor
摘要 A CMOS or bipolar based Ion Sensitive Field Effect Transistor (ISFET) comprising an ion sensitive recess for holding a liquid wherein the recess is formed at least partly on top of a gate of the transistor. There is also provided a method of manufacturing an I on Sensitive Field Effect Transistor (ISFET) utilizing CMOS processing steps, the method comprising forming an ion sensitive recess for holding a liquid at least partly on top of a gate of the transistor.
申请公布号 US9304104(B2) 申请公布日期 2016.04.05
申请号 US201314072908 申请日期 2013.11.06
申请人 X-FAB SEMICONDUCTOR FOUNDRIES AG 发明人 Koo Sang Sool;Fang Ling Gang
分类号 G01N27/414 主分类号 G01N27/414
代理机构 Nixon & Vanderhye PC 代理人 Nixon & Vanderhye PC
主权项 1. A CMOS or bipolar based Ion Sensitive Field Effect Transistor (ISFET) comprising: an ion sensitive recess for holding a liquid wherein the recess is formed at least partly on top of a gate of the transistor, a dielectric material over a semiconductor substrate comprising a drain and a source wherein the dielectric material is in contact with, or surrounds, the recess, and wherein the dielectric material further includes an inter-layer dielectric on top of the substrate, the inter-layer dielectric at least partially covering the gate.
地址 Erfurt DE