Microlithography illumination system and microlithography illumination optical unit

摘要

An illumination optical unit for microlithography illuminates an object field with illumination light. The unit includes a first facet mirror that has a plurality of first facets, and a second facet mirror that has a plurality of second facets. The unit has facet pairs which include respectively a facet of the first facet mirror and a facet of the second facet mirror which predefine a plurality of illumination channels for illuminating the object field. At least some of the illumination channels have in each case an assigned polarization element for predefining an individual polarization state of the illumination light guided in the respective illumination channel.

主权项

1. An illumination system, comprising:
an optical unit, comprising:
a first mirror comprising a polarization element, wherein:
the polarization element is a wire grating pivotable about an axis perpendicular to a reflection surface of the first mirror;the optical unit is configured to be used in microlithography;the first mirror is a first facet mirror comprising a plurality of first facets;the illumination system further comprises a second facet mirror comprising a plurality of second facets;a facet pair comprises a facet of the first plurality of facets and a facet of the second plurality of facets;the facet pair defines an illumination channel;the polarization element is configured to define an individual polarization state of EUV radiation guided in the illumination channel during use of the illumination system; andthe illumination system is configured to be used in microlithography.