发明名称 Texturing of monocrystalline semiconductor substrates to reduce incident light reflectance
摘要 Monocrystalline semiconductor substrates are textured with alkaline solutions to form pyramid structures on their surfaces to reduce incident light reflectance and improve light absorption of the wafers. The alkaline baths include hydantoin compounds and derivatives thereof in combination with alkoxylated glycols to inhibit the formation of flat areas between pyramid structures to improve the light absorption.
申请公布号 US9303207(B2) 申请公布日期 2016.04.05
申请号 US201414295262 申请日期 2014.06.03
申请人 发明人 Toben Michael P.;Barr Robert K.;O'Connor Corey
分类号 C09K13/06;C09K13/00;C09K13/02;A01N35/08;A01N43/28;C07D275/04;C23C18/40;C23C18/38;H01L31/0236;G02B1/111 主分类号 C09K13/06
代理机构 代理人 Piskorski John J.
主权项 1. A texturing composition consisting of one or more compounds chosen from hydantoin and hydantoin derivatives, one or more alkoxylated glycols and one or more alkaline compounds selected from the group consisting of potassium hydroxide, sodium hydroxide, lithium hydroxide, quaternary ammonium hydroxides, ammonium hydroxide and alkanolamines, and one or more organic solvents having a flash point of 75° C. or greater, water and optionally one or more oxygen scavengers.
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