| 摘要 |
Provided are a light irradiation apparatus which prevents or suppresses irradiation to another adjacent portion and enables an overall apparatus to be configured in a small size, and a light-curable material processing apparatus including the light irradiation apparatus. Given a three-dimensional XYZ Cartesian coordinate system in which an axis extending in a vertical direction is set as a Z axis, a light source unit is configured such that a plurality of light emitting elements are arranged in parallel in the same plane so that a center of a light emission surface thereof is located on an X axis, the center of the light emission surface of the light emitting elements including an XZ plane is set as a reference surface, a first refection unit having a function of directing light from the light source unit toward both directions of an Y axis and blocking light directed toward a minus direction of the Y axis is disposed at a location on a minus direction side of the Y axis with respect to the reference surface to extend in an X-axis direction, and a second reflection unit having a function of reflecting light from the light source unit and light from the first reflection unit toward both directions of the Y axis is disposed a location on a both direction side of the Y axis with reference to the reference surface to extend in an X-axis direction. |
