Arrangement for actuating an element in a microlithographic projection exposure apparatus

摘要

An arrangement actuates an element in a microlithographic projection exposure apparatus. The arrangement includes first and second actuators and first and second mechanical couplings. The first and second actuators are coupled to the element via corresponding ones of the first and second mechanical couplings for applying respective forces to the element which is regulatable in at least one degree of freedom. The first and second actuators have first and second actuator masses, respectively, and the first actuator mass and the first mechanical coupling conjointly define a first mass-spring system operating as a first low-pass filter. The second actuator mass and the second mechanical coupling conjointly define a second mass-spring system operating as a second low-pass filter. The first and second mass-spring systems have first and second natural frequencies deviating from each other by a maximum deviation equal to 10% of the largest of the first and second natural frequencies.

主权项

1. An arrangement for actuating an element in a microlithographic projection exposure apparatus, the arrangement comprising:
first and second actuators; first and second mechanical couplings; said first and second actuators being coupled to said element via corresponding ones of said first and second mechanical couplings for applying respective forces to said element regulatable in at least one degree of freedom; said first and second actuators having first and second actuator masses, respectively; said first actuator mass and said first mechanical coupling conjointly defining a first mass-spring system operating as a first low-pass filter; said second actuator mass and said second mechanical coupling conjointly defining a second mass-spring system operating as a second low-pass filter; and, said first and second mass-spring systems having first and second natural frequencies deviating from each other by a maximum deviation equal to 10% of the largest of said first and second natural frequencies.