PHASE SHIFT BLANKMASK AND PHOTOMASK

摘要

The present invention provides a phase inversion blank mask and a photomask using the same, forming a phase inversion film with a metal silicide compound, so pattern formation can be easily controlled when a pattern is formed. In the phase inversion blank mask having a phase inversion film and a shading membrane on a transparent substrate, the phase inversion film has transmittance of 1 to 30% for exposure light of g-line, h-line, and i-line individually.