发明名称 |
High-electron-mobility transistors |
摘要 |
High-electron-mobility transistors that include field plates are described. In a first implementation, a HEMT includes a first and a second semiconductor material disposed to form a heterojunction at which a two-dimensional electron gas arises and source, a drain, and gate electrodes. The gate electrode is disposed to regulate conduction in the heterojunction between the source electrode and the drain electrode. The gate has a drain-side edge. A gate-connected field plate is disposed above a drain-side edge of the gate electrode and extends laterally toward the drain. A second field plate is disposed above a drain-side edge of the gate-connected field plate and extends laterally toward the drain. |
申请公布号 |
US9306014(B1) |
申请公布日期 |
2016.04.05 |
申请号 |
US201414581645 |
申请日期 |
2014.12.23 |
申请人 |
POWER INTEGRATIONS, INC. |
发明人 |
Kudymov Alexey;Ramdani Jamal;Liu Linlin |
分类号 |
H01L29/778;H01L29/40;H01L29/66;H01L29/51 |
主分类号 |
H01L29/778 |
代理机构 |
Mayer & Williams PC |
代理人 |
Mayer Stuart H.;Mayer & Williams PC |
主权项 |
1. A high-electron-mobility transistor (HEMT) comprising:
a first semiconductor material and a second semiconductor material disposed to form a heterojunction at which a two-dimensional electron gas arises; a source electrode, a drain electrode, and a gate electrode, the gate electrode disposed to regulate conduction in the heterojunction between the source electrode and the drain electrode, the gate having a drain-side edge; a gate-connected field plate disposed above a drain-side edge of the gate electrode and extending laterally toward the drain; and a second field plate disposed above a drain-side edge of the gate-connected field plate and extending laterally toward the drain,wherein, in the OFF state and at a potential difference between the source and the drain in excess of the absolute value of a gate swing amplitude, charge carriers are depleted from a portion of the heterojunction in a vicinity of the drain-side edge of the gate-connected field plate, the depletion of charge carriers effective to saturate a lateral electric field in the heterojunction in a vicinity of the drain-side edge of the gate electrode. |
地址 |
San Jose CA US |