发明名称 Substrate processing system with mechanically floating target assembly
摘要 Substrate processing systems are provided herein. In some embodiments, a substrate processing system may include a target assembly having a target comprising a source material to be deposited on a substrate; a grounding assembly disposed about the target assembly and having a first surface that is generally parallel to and opposite a backside of the target assembly; a support member coupled to the grounding assembly to support the target assembly within the grounding assembly; one or more insulators disposed between the backside of the target assembly and the first surface of the grounding assembly; and one or more biasing elements disposed between the first surface of the grounding assembly and the backside of the target assembly to bias the target assembly toward the support member.
申请公布号 US9303311(B2) 申请公布日期 2016.04.05
申请号 US201213435949 申请日期 2012.03.30
申请人 APPLIED MATERIALS, INC. 发明人 Young Donny;Ritchie Alan;Pai Uday;Rasheed Muhammad;Miller Keith A.
分类号 C23C14/24;C23C14/34;H01J37/34;C23C14/35 主分类号 C23C14/24
代理机构 Moser Taboada 代理人 Moser Taboada ;Taboada Alan
主权项 1. A substrate processing system, comprising: a target assembly having a target comprising a source material to be deposited on a substrate; a grounding assembly disposed about the target assembly and having a first surface that is generally parallel to and opposite a backside of the target assembly, wherein the grounding assembly is electrically separated from the target assembly; a support member coupled to the grounding assembly to support the target assembly within the grounding assembly; one or more insulators disposed between the backside of the target assembly and the first surface of the grounding assembly; and one or more biasing elements disposed between the first surface of the grounding assembly and the backside of the target assembly to bias the target assembly toward the support member.
地址 Santa Clara CA US