发明名称 |
ABNORMALITY DETECTION SYSTEM AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide an abnormality detection system capable of detecting the abnormality of an auxiliary machine accessory to a semiconductor manufacturing device and a method for manufacturing a semiconductor device.SOLUTION: The abnormality detection system of an auxiliary machine accessory to a semiconductor manufacturing device includes: a collection part 110; a first calculation part 120; a second calculation part 130; and a determination part 140. The collection part collects a plurality of types of parameters related to the state of the auxiliary machine. The first calculation part calculates degrees of divergence of coordinate points in a virtual coordinate space about the plurality of types of parameters from a reference space. The coordinate points are points shown by the collected plurality of types of parameters. The second calculation part accumulates the calculated degrees of divergence to calculate a cumulative degree of divergence. The determination part compares the calculated cumulative degree of divergence with a threshold to determine the abnormality of the auxiliary machine.SELECTED DRAWING: Figure 1 |
申请公布号 |
JP2016045808(A) |
申请公布日期 |
2016.04.04 |
申请号 |
JP20140170924 |
申请日期 |
2014.08.25 |
申请人 |
TOSHIBA CORP |
发明人 |
MIKI TSUTOMU |
分类号 |
G05B23/02;H01L21/02;H01L21/3065;H01L21/31 |
主分类号 |
G05B23/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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