发明名称 ABNORMALITY DETECTION SYSTEM AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide an abnormality detection system capable of detecting the abnormality of an auxiliary machine accessory to a semiconductor manufacturing device and a method for manufacturing a semiconductor device.SOLUTION: The abnormality detection system of an auxiliary machine accessory to a semiconductor manufacturing device includes: a collection part 110; a first calculation part 120; a second calculation part 130; and a determination part 140. The collection part collects a plurality of types of parameters related to the state of the auxiliary machine. The first calculation part calculates degrees of divergence of coordinate points in a virtual coordinate space about the plurality of types of parameters from a reference space. The coordinate points are points shown by the collected plurality of types of parameters. The second calculation part accumulates the calculated degrees of divergence to calculate a cumulative degree of divergence. The determination part compares the calculated cumulative degree of divergence with a threshold to determine the abnormality of the auxiliary machine.SELECTED DRAWING: Figure 1
申请公布号 JP2016045808(A) 申请公布日期 2016.04.04
申请号 JP20140170924 申请日期 2014.08.25
申请人 TOSHIBA CORP 发明人 MIKI TSUTOMU
分类号 G05B23/02;H01L21/02;H01L21/3065;H01L21/31 主分类号 G05B23/02
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