发明名称 SEMICONDUCTOR DEVICE INSPECTION APPARATUS, SEMICONDUCTOR DEVICE INSPECTION METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor device inspection apparatus for evaluating an insulating film by a MOS capacitor.SOLUTION: A stage 10 is an XY stage for mounting a semiconductor device 18 to be inspected, and at least a part of which is conductive. A first terminal 12 and a second terminal 14, that are conductivity probes, include a function for applying a voltage or a current to the semiconductor device 18, and are connected with a power supply 20 on the outside of a semiconductor device inspection apparatus 100. The first terminal 12 is connected electrically with the conductive stage 10, and voltage is applied from the back side of the semiconductor device 18 in contact with the stage 10.SELECTED DRAWING: Figure 1
申请公布号 JP2016046352(A) 申请公布日期 2016.04.04
申请号 JP20140168812 申请日期 2014.08.21
申请人 TOSHIBA CORP 发明人 OHASHI TERUYUKI;IIJIMA RYOSUKE
分类号 H01L21/66 主分类号 H01L21/66
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