| 摘要 |
PROBLEM TO BE SOLVED: To provide a phase-shift blank mask; and to provide a photomask.SOLUTION: Disclosed is a phase-shift blank mask, wherein a light-shielding film includes a metal compound having a structure of a multi-layer film or a continuous film, which includes a first light-shielding layer and a second light-shielding layer. The second light-shielding layer has higher optical density at an exposure wavelength per unit thickness than the first light-shielding layer. The first light-shielding layer occupies 70% to 90% of the whole thickness of the light-shielding film. With this, the blank mask secures a light-shielding effect, has an improved etching speed, and makes a resist film thinner, thereby achieving a fine pattern.SELECTED DRAWING: Figure 1 |
