发明名称 METHOD OF ACQUIRING EBSP PATTERNS
摘要 PROBLEM TO BE SOLVED: To provide a method of acquiring an Energy Backscattering Pattern (EBSP) image of a sample with improved resolution and better contrast of Kikuchi lines in a charged particle apparatus, the sample showing a flat surface, the charged particle apparatus equipped with an electron column for producing a finely focused electron beam, a position sensitive detector, and a sample holder for holding and positioning the sample.SOLUTION: The method comprises the steps of: positioning the sample with respect to the electron beam, applying the electron beam to an impact point on the sample to detect a backscattering electron with a detector, and acquiring the signal from the detector while the beam is kept stationary. The detector selectively detects electrons with an energy above a predefined threshold, and the signal of the electrons with an energy above the threshold is used to form an EBSP image.SELECTED DRAWING: Figure 2
申请公布号 JP2016045206(A) 申请公布日期 2016.04.04
申请号 JP20150162373 申请日期 2015.08.20
申请人 FEI CO 发明人 MAREK UNCOVSKY;PAVEL STEJSKAL;TOMAS VYSTAVEL
分类号 G01N23/20;G01N23/205 主分类号 G01N23/20
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