METHODS OF FORMING PHOTOLITHOGRAPHIC PATTERNS

摘要

Provided is a method for forming a photolithographic pattern by using a negative ton development process. In addition, provided are a coated substrate and an electronic device formed by the method. The method can be used to manufacture the electronic device. To this end, the method for forming a photolithographic pattern includes the following steps: (a) providing a substrate including at least one layer to be patterned on a surface thereof; (b) applying a photoresist composition layer comprising a resin including an acid cleavable group and an acid generator on the at least one layer to be patterned; (c) patternwise exposing the photoresist composition layer to an actinic radiation to be patterned; and (d) applying a developer on the photoresist composition layer.