METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE WITH DIFFUSION LAYER, AND SEMICONDUCTOR SUBSTRATE WITH DIFFUSION LAYER

摘要

PROBLEM TO BE SOLVED: To provide: a method for manufacturing a semiconductor substrate with a diffusion layer, by which a longer lifetime can be realized without increasing the number of processes; and a semiconductor substrate with a diffusion layer.SOLUTION: A method for manufacturing a semiconductor substrate with a diffusion layer comprises the steps of: applying a p-type diffusion layer-forming composition including a compound including an acceptor element to a semiconductor substrate; forming a p-type diffusion layer by performing a thermal diffusion process; and oxidizing the semiconductor substrate.SELECTED DRAWING: Figure 1