RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

摘要

PROBLEM TO BE SOLVED: To provide a resist composition that can achieve high sensitivity and allows formation of a resist pattern with high resolution.SOLUTION: The resist composition comprises a polymeric compound having such a structural unit that is derived from an acrylate in which a hydrogen atom bonded to a carbon atom at an α-position may be replaced by a substituent and that has a lactone group-containing cyclic group containing a group represented by general formula (a0-r-1) in a side chain terminal. In formula (a0-r-1), Raand Raeach independently represent a hydrogen atom or a non-aromatic hydrocarbon group which may have a substituent, or Raand Ramay be bonded to each other to form a ring together with a carbon atom to which Rais bonded and with a nitrogen atom to which Rais bonded; and * represents a bond.SELECTED DRAWING: None