SUBSTRATE TREATMENT APPARATUS AND PROCESS GAS GENERATOR

摘要

PROBLEM TO BE SOLVED: To improve the generation efficiency of a process gas generated by reacting a liquid raw material with a reaction gas.SOLUTION: A substrate treatment apparatus comprises: a vessel that holds a liquid raw material generated by melting a metal raw material stored therein, and receives supply of a reaction gas from upstream and discharges a process gas from downstream; and at least one partition member that is installed in the vessel to partition a space in the vessel above the liquid surface of the liquid raw material in the vessel into a plurality of generation spaces arranged sequentially from upstream to downstream. A through hole communicating two adjacent generation spaces with each other to allow gas pass therethrough is formed in each partition member. When the gas in the upstream side generation space passes through the through hole to flow into the downstream side generation space, the flow rate of the gas passing through the through hole is increased to generate a jet flow and a convection flow of the gas in the downstream side generation space is caused by the jet flow.SELECTED DRAWING: Figure 1