发明名称 |
HYDROPHOBIC TREATMENT METHOD, HYDROPHOBIC TREATMENT DEVICE, AND RECORDING MEDIUM FOR HYDROPHOBIC TREATMENT |
摘要 |
PROBLEM TO BE SOLVED: To provide a hydrophobic treatment method capable of sufficiently and stably imparting hydrophobicity expected according to a heat treatment temperature of a substrate to the substrate, a hydrophobic treatment device, and a recording medium.SOLUTION: A hydrophobic treatment method for hydrophobizing a surface of a substrate comprises the steps of: (A) supplying a process gas for hydrophobing to the surface of the substrate; (B) exposing the surface of the substrate to the atmosphere containing the process gas over a prescribed time; and (C) heating the substrate in the presence of the process gas after the step (B).SELECTED DRAWING: Figure 5 |
申请公布号 |
JP2016046515(A) |
申请公布日期 |
2016.04.04 |
申请号 |
JP20150101193 |
申请日期 |
2015.05.18 |
申请人 |
TOKYO ELECTRON LTD |
发明人 |
KAMIMURA RYOICHI;UCHIDA JUNICHI;KAMEI YUYA |
分类号 |
H01L21/027 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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