发明名称 FOR FORMING FILM FOR SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To provide a method for forming a film for a substrate which is suitable for a substrate such as plastic that is thermally deformed, is simple and excellent in productivity, is also excellent in persistence of functionality, and modifies the surface of a substrate and imparts functionality thereto.SOLUTION: A method for forming a film for a substrate sequentially includes steps of: (1) forming a primer coating film layer using a composition (1) containing a resin (A) having an isocyanate reactive group and an isocyanate group-containing polymerizable unsaturated compound (B); (2) forming a functionality imparting layer on the substrate on which the primary coating film layer is formed in the step (1) using a composition (2) containing a functionality imparting group-containing polymerizable unsaturated compound and a thermal polymerization initiator; and (3) heating the substrate on which the primer coating film layer and the functionality imparting layer are formed in the steps (1) and (2).SELECTED DRAWING: None
申请公布号 JP2016043325(A) 申请公布日期 2016.04.04
申请号 JP20140170394 申请日期 2014.08.25
申请人 KANSAI PAINT CO LTD 发明人 OCHI TOSHIRO
分类号 B05D7/24;B05D5/00;B32B27/40;C08G18/62;C08G18/81;C09D4/00;C09D5/00;C09D175/04 主分类号 B05D7/24
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