NOVEL ONIUM SALT COMPOUND, RESIST COMPOSITION, AND PATTERN FORMING METHOD

摘要

SOLUTION: To provide an onium salt compound represented by formula (1), where Zrepresents a specific sulfonium cation or a specific iodonium cation.EFFECT: The onium salt compound is included in a resist composition of the present invention and the compound favorably functions as an acid diffusion controlling agent. As a result, such a pattern profile can be structured that has a reduced mask error factor (MEF) and fluctuations of a pattern line width (LWR), excellent depth of focus and high resolution. The obtained resist composition can respond to shorter wavelengths of a light source and a higher numerical aperture (NA) of a projection lens.SELECTED DRAWING: None