| 摘要 |
PROBLEM TO BE SOLVED: To improve the generation efficiency of a process gas generated by reacting a liquid raw material with a reaction gas.SOLUTION: A substrate treatment apparatus, which treats a substrate using a process gas generated by reacting a liquid raw material with a reaction gas, comprises: a vessel that holds a liquid raw material generated by melting a metal raw material, and receives supply of the reaction gas from upstream and discharges a process gas from downstream; and at least one partition member that is installed in the vessel to partition a space in the vessel above the liquid surface of the liquid raw material in the vessel into a plurality of generation spaces arranged sequentially from upstream to downstream. A rectification mechanism that makes the gas flow toward the liquid surface of the liquid raw material is installed in each generation space.SELECTED DRAWING: Figure 1 |
