发明名称 |
NONPOLAR OR SEMIPOLAR GaN SUBSTRATE |
摘要 |
PROBLEM TO BE SOLVED: To provide a disk type nonpolar or semipolar GaN substrate which has excellent in-plane uniformity in temperature when heated through a susceptor.SOLUTION: There is provided a disk type nonpolar or semipolar GaN substrate 10 whose top surface 11 is not a concave surface even at room temperature. The GaN substrate 10 is such that: the top surface 11 may be a convex surface at room temperature and has a diameter of 4.5-5.5 cm; an SORI value of the top surface 11 at room temperature is 20 μm or less, (the SORI value being an index for quantizing a degree of warpage of the substrate and a value obtained by totaling a distance between a highest point on the top surface and a reference surface and a distance between a lowest point the top surface and the reference surface, where the reference surface is a least square plane of the top surface of the substrate); and the angle between a normal to the top surface 11 and an "m" axis is 0-20° or less. The semipolar GaN substrate 10 is a GaN substrate 10 made of GaN crystal of less than 1×10cmin alkali metal concentration and 2 cmor less in absorption coefficient at 450 nm.SELECTED DRAWING: Figure 1 |
申请公布号 |
JP2016044094(A) |
申请公布日期 |
2016.04.04 |
申请号 |
JP20140168566 |
申请日期 |
2014.08.21 |
申请人 |
MITSUBISHI CHEMICALS CORP |
发明人 |
TSUKADA YUSUKE;KAJIMOTO TETSUJI;FUKADA TAKASHI;NAGAO SATORU;KAMATA KAZUNORI;FUJITO TAKESHI;FUJISAWA HIDEO;MIKAWA YUTAKA |
分类号 |
C30B29/38 |
主分类号 |
C30B29/38 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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