| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing apparatus which enables improvement of uniformity of gas flow in a processing container while maintaining a function of a service port provided at the processing container.SOLUTION: A substrate processing apparatus 1 includes: a processing container 10; a placement base 11; a division wall 12; a lifting mechanism 32 which moves up or down the division wall 12; a service port 40 provided on a side wall of the processing container 10; a first seal mechanism 50 provided at a position of the service port 40 in the processing container 10; and a second seal mechanism 60 provided at a position of the division wall 12 which faces the service port 40. A first seal surface 52 of the first seal mechanism 50 and a second seal surface of the second seal mechanism 60 are provided at positions such that the seal surfaces contact with each other when the division wall 12 is moved to a substrate processing position.SELECTED DRAWING: Figure 1 |
