发明名称 PROCESSING APPARATUS AND PROCESSING METHOD
摘要 The present invention provides a processing apparatus and a processing method which can replace a wafer in a dummy stocker without affecting processing. The processing apparatus (1) comprises: a load port (2) in which a transport container (21) accommodating a plurality of semiconductor wafers is arranged; a dummy wafer storage area (3) in which a transport container (31) accommodating a plurality of dummy wafers is arranged; a normal-pressure transport room (4) in which a first transport arm (8) is installed; a device (71) which processes the semiconductor wafers in a state where the semiconductor wafers and the dummy wafers which are transported are arranged in slots (80); and a control unit (100) which controls each component of the processing apparatus. The control unit (100) classifies the dummy wafers accommodated in the transport container (31) into a plurality of groups, and controls the first transport arm (8) to preferentially transport the dummy wafers in one of the classified groups to the device (71) and in replacing the dummy wafers, to perform replacement of the dummy wafers group to group as classified.
申请公布号 KR20160036481(A) 申请公布日期 2016.04.04
申请号 KR20150126970 申请日期 2015.09.08
申请人 TOKYO ELECTRON LIMITED 发明人 ITO NAOHIDE;MORISAWA DAISUKE;OSADA KEIJI
分类号 H01L21/677 主分类号 H01L21/677
代理机构 代理人
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