| 摘要 |
According to the present invention, polysilylalkane is represented by chemical formula 3. In chemical formula 3, m is equal to n, and n is equal to zero; and R^3 is a chloromethyl group. In the case of R^4 is H, -SiMe_2Cl, -SiMe_3, -SiMeCl_2, and -SiCl_3, R^3 is equal to -SiCl_3. In the case of R^4 is H, and R^5 is equal to R^6 and R^6 is equal to Me, or R^5 is equal to Me and R^6 is equal to Et, R^3 is -SiCl_3. In the case of R^4 is H, R^5 is equal to -CH_2SiCl_3, and R^6 is Me, R^3 is equal to -SiCl_3. In the case of R^4 is H, R^5 is equal to R^6 and R^6 is equal to -CH_2SiCl_3, R^3 is equal to Et, SiMe_2Cl, -SiMeCl_2, and -SiCl_3, and m is an integer of zero to nine. The manufacturing method is capable of manufacturing bis(silyl)alkane or tri(silyl)alkane in a high yield with a small amount of a catalyst. |
