发明名称 |
LARGE SCALE AND THICKNESS-MODULATED MoS2 NANOSHEETS |
摘要 |
The invention is for fabricating large-area, thickness-modulated MoS2, varying from single to few layer MoS2 films on various substrates using a combination of magnetron sputtering followed by chemical vapor deposition. The thickness dependent energy bandgap engineering and surface induced polarity change is disclosed. |
申请公布号 |
US2016093491(A1) |
申请公布日期 |
2016.03.31 |
申请号 |
US201514868428 |
申请日期 |
2015.09.29 |
申请人 |
University of North Texas |
发明人 |
Choi Wonbong;Choudhary Nitin |
分类号 |
H01L21/02;H01L29/786;H01L29/66 |
主分类号 |
H01L21/02 |
代理机构 |
|
代理人 |
|
主权项 |
1. A method of making a thin layer MoS2 on a substrate comprising the steps of:
providing a substrate; providing a Molybdenum source; using a magnetron to induce a plasma to generate Molybdenum ions from the Molybdenum source; sputtering the Molybdenum ions on the substrate to form a thin layer of Molybdenum; placing the substrate in a CVD chamber; providing a sulphur source; forming a sulphur vapor from the sulphur source, wherein the sulphur vapor is in communication with the CVD chamber; and sulphurizing the thin layer of Molybdenum to form a thin layer of Molybdenum disulfide MoS2. |
地址 |
Denton TX US |