发明名称 LARGE SCALE AND THICKNESS-MODULATED MoS2 NANOSHEETS
摘要 The invention is for fabricating large-area, thickness-modulated MoS2, varying from single to few layer MoS2 films on various substrates using a combination of magnetron sputtering followed by chemical vapor deposition. The thickness dependent energy bandgap engineering and surface induced polarity change is disclosed.
申请公布号 US2016093491(A1) 申请公布日期 2016.03.31
申请号 US201514868428 申请日期 2015.09.29
申请人 University of North Texas 发明人 Choi Wonbong;Choudhary Nitin
分类号 H01L21/02;H01L29/786;H01L29/66 主分类号 H01L21/02
代理机构 代理人
主权项 1. A method of making a thin layer MoS2 on a substrate comprising the steps of: providing a substrate; providing a Molybdenum source; using a magnetron to induce a plasma to generate Molybdenum ions from the Molybdenum source; sputtering the Molybdenum ions on the substrate to form a thin layer of Molybdenum; placing the substrate in a CVD chamber; providing a sulphur source; forming a sulphur vapor from the sulphur source, wherein the sulphur vapor is in communication with the CVD chamber; and sulphurizing the thin layer of Molybdenum to form a thin layer of Molybdenum disulfide MoS2.
地址 Denton TX US