| 发明名称 |
METHOD OF AND APPARATUS FOR IN-SITU REPAIR OF REFLECTIVE OPTIC |
| 摘要 |
Method of and apparatus for repairing an optical element disposed in a vacuum chamber while the optical element is in the vacuum chamber. An exposed surface of the optical element is exposed to an ion flux generated by an ion source to remove at least some areas of the surface that have been damaged by exposure to the environment within the vacuum chamber. The method and apparatus are especially applicable to repair multilayer mirrors serving as collectors in systems for generating EUV light for use in semiconductor photolithography. |
| 申请公布号 |
US2016091803(A1) |
申请公布日期 |
2016.03.31 |
| 申请号 |
US201514964319 |
申请日期 |
2015.12.09 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
ERSHOV Alexander I. |
| 分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method of repairing an optical element disposed in a vacuum chamber comprising the steps of:
cleaning an exposed surface of the optical element while the optical element is in the vacuum chamber to remove at least some of a contaminant on the exposed surface to produce a cleaned exposed surface; and exposing the cleaned exposed surface while the optical element is in the vacuum chamber to an ion flux generated by an ion gun to remove at least some areas of the surface that have been damaged by exposure to the environment within the vacuum chamber. |
| 地址 |
Veldhoven NL |
