Lithographic apparatus and a method of manufacturing a device using a lithographic apparatus.

摘要

A lithographic apparatus comprising a projection system for projecting a patterned radiation beam onto a substrate and a fluid confinement structure configured to confine immersion fluid in a localized region between a final element of the projection system and a surface of the substrate. The lithographic apparatus is configured to have a space bounded on one side by a surface of at least one of the projection system and a component of the lithographic apparatus at least partially surrounding the final element of the projection system and on the other side by a surface of the fluid confinement structure. The apparatus is configured to maximize the humidity of the gas within the space.