摘要 |
Disclosed are an exposure device and an out-of-focus and tilt error compensation method. On each alignment measurement sensor (500a, 500b, 500c, 500d, 500e, 500f), there is provided a focusing measurement sensor (600a, 600b, 600c, 600d, 600e, 600f) corresponding thereto, and each alignment measurement sensor (500a, 500b, 500c, 500d, 500e, 500f) has the same coordinates in a first direction as those of the focusing measurement sensor (600a, 600b, 600c, 600d, 600e, 600f) corresponding thereto, so that the alignment measurement sensors (500a, 500b, 500c, 500d, 500e, 500f) and the focusing measurement sensors (600a, 600b, 600c, 600d, 600e, 600f) are both located on the same straight line, in which case alignment marks can be characterized together by focusing measurement information and alignment measurement information, in order to provide corrections in case of errors in the alignment measurement information, complete compensation for out-of-focus and tilt errors, improve alignment precision greatly and increase product yield. |
申请人 |
SHANGHAI MICRO ELECTRONICS EQUIPMENT CO.,LTD. |
发明人 |
CHEN, FEIBIAO;ZHOU, CHANG;CHEN, YUEFEI;CHENG, QI;DIAO, LEI;QI, JINGCHAO |