| 摘要 |
PROBLEM TO BE SOLVED: To provide an ultraviolet absorber, which is added to a composition for forming a resist under layer film so that reflection can be suppressed particularly in a lithography process by an ultraviolet laser and a pattern profile can be improved without influencing dry etching mask properties or adhesiveness to a resist pattern, compared with a case using a conventional silicon-containing resist under layer film.SOLUTION: The ultraviolet absorber contains a compound represented by the general formula (A-1) in the figure, (In the formula, R represents a methyl group, an ethyl group, a propyl group, or an allyl group; and R, R, R, and Rmay be identical or different, and each represent a hydrogen atom, a benzoyl group, a toluoyl group, a naphthoyl group, or an anthranoyl group.)SELECTED DRAWING: None |
