发明名称 COMPOUND SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a compound semiconductor device capable of suppressing a decrease in a maximum oscillation frequency caused by increase of drain conductance, and a method for manufacturing the same.SOLUTION: The compound semiconductor device comprises; a buffer layer 102; a carrier supply layer 103 on a surface of the buffer layer 102; a channel layer 104 on the carrier supply layer 103; a barrier layer 105 on the channel layer 104, forming type II of hetero junction with the channel layer 104; a source electrode 111 and a drain electrode 112 above the channel layer 104; and a gate electrode 113 above the barrier layer 105.SELECTED DRAWING: Figure 1
申请公布号 JP2016042537(A) 申请公布日期 2016.03.31
申请号 JP20140166060 申请日期 2014.08.18
申请人 FUJITSU LTD 发明人 TAKAHASHI TAKESHI
分类号 H01L21/338;H01L21/336;H01L29/778;H01L29/78;H01L29/812 主分类号 H01L21/338
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