EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD

摘要

An exposure apparatus includes: a projection optical system; an adjusting unit configured to adjust imaging characteristics of the projection optical system; and a controller configured to divide the plurality of shot regions into groups based on data of a shift in the pattern of each shot region and an order of the exposure, determine setting amounts of the imaging characteristics for each group, and control the adjusting unit to set the imaging characteristics to the setting amounts for each group. The setting amount is common to a plurality of shot regions in the group and varies among the groups. The controller performs the division such that the shot regions belonging to the same group have a sequential exposure order and all values of the shift in the shot regions belonging to the same group fall within a predetermined range.

主权项

1. An exposure apparatus for performing an exposure on each of a plurality of shot regions on a substrate in a predetermined order, the apparatus comprising:
a projection optical system configured to project a pattern of an original on each of the plurality of shot regions; an adjusting unit configured to adjust imaging characteristics of the projection optical system; and a controller configured to divide the plurality of shot regions into groups based on data of a shift in the pattern of each of the plurality of shot regions and an order of the exposure, determine setting amounts of the imaging characteristics for each of the divided groups, and control the adjusting unit to set the imaging characteristics to the setting amounts for each group, wherein the setting amount is common to a plurality of shot regions in the group and varies among the groups, and wherein the controller performs the division such that the shot regions belonging to the same group have a sequential exposure order and all values of the shift in the shot regions belonging to the same group fall within a predetermined range.