发明名称 ILLUMINATION SYSTEM
摘要 An illumination system (IL) for a lithographic apparatus comprises an array of lenses (2a-h) configured to receive a beam of radiation (B) and focus the beam of radiation into a plurality of sub-beams (4a-h), an array of reflective elements (6a-h) configured to receive the sub-beams and reflect the sub-beams so as to form an illumination beam (8), a beam splitting device (10) configured to split the illumination beam into a first portion (12) and a second portion (14) wherein the first portion is directed to be incident on a lithographic patterning device (MA), a focusing unit (22) configured to focus the second portion of the illumination beam onto a detection plane such that an image is formed at the detection plane and wherein the image is an image of the sub-beams in which the sub-beams do not overlap with each other and an array of detector elements (24) configured to measure the intensity of radiation which is incident on the detection plane.
申请公布号 WO2016045897(A1) 申请公布日期 2016.03.31
申请号 WO2015EP69508 申请日期 2015.08.26
申请人 ASML NETHERLANDS B.V. 发明人 GODFRIED, HERMAN, PHILIP;VAN BUSSEL, HUBERTUS, PETRUS, LEONARDUS, HENRICA;OP 'T ROOT, WILHELMUS, PATRICK, ELISABETH, MARIA
分类号 G03F7/20 主分类号 G03F7/20
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