Air Gap Structure and Method

摘要

A device comprises a first protection layer over sidewalls and a bottom of a first trench in a first dielectric layer, a first barrier layer over the first protection layer, a first metal line in the first trench, a second protection layer over sidewalls and a bottom of a second trench in the first dielectric layer, a second barrier layer over the second protection layer, a second metal line in the first trench, an air gap between the first trench and the second trench and a third protection layer over sidewalls of a third trench in the first dielectric layer, wherein the first protection layer, the second protection layer and the third protection are formed of a same material.

主权项

1. A device comprising:
an air gap between a first metal line and a second metal line in a first dielectric layer, wherein:
the first metal line and the first dielectric layer are separated by a first protection layer; andthe second metal line and the first dielectric layer are separated by a second protection layer; and a first metal structure in the first dielectric layer, wherein an upper portion of the first metal structure and the first dielectric layer are separated by a third protection layer, and wherein the first protection layer, the second protection layer and the third protection layer are formed of a same material.