ILLUMINATION OPTICS FOR PROJECTION LITHOGRAPHY AND HOLLOW WAVEGUIDE COMPONENT THEREFOR

摘要

Illumination optics for projection lithography for guiding illumination light (8) from a light source (6) to an object field, in which an object to be imaged can be arranged, have a mirror array (10) having a multiplicity of individual mirrors which can be tilted independently of one another by means of actuators and are connected to associated tilting actuators. Condenser optics are used to convert an arrangement plane (10a) of the mirror array (10) into a pupil plane of the illumination optics. An optical hollow waveguide component (31) of the illumination optics is arranged upstream of the mirror array (10) in the beam path of the illumination light (8) and is used to homogenize and stabilize an illumination light bundle (32) impinging on the mirror array (10). Coupling-in optics (29) for coupling an incident illumination light bundle (30) into the hollow waveguide component (31) are arranged upstream of the hollow waveguide component (31). Relay optics (34) are used to image a bundle exit area (35) of the hollow waveguide component (31) onto the mirror array (10). Illumination optics which are insensitive to light source instabilities result.