FOCUSED ION BEAM SYSTEMS AND METHODS OF OPERATION

摘要

A focused ion beam system is provided. The focused ion beam system includes a plasma generation chamber configured to contain a source gas that is radiated with microwaves to produce plasma. The plasma generation chamber includes a plasma confinement device configured to confine the plasma in radial and axial directions within the plasma generation chamber and to form a plasma meniscus at an extraction end of the plasma generation chamber. The focused ion beam system also includes a beam extraction chamber configured to extract a focused ion beam from the confined plasma and to focus the extracted focused ion beam on a workpiece.

主权项

1. A focused ion beam (FIB) system comprising:
a plasma generation chamber configured to contain a source gas that is radiated with microwaves to produce plasma, wherein the plasma generation chamber comprises:
a multicusp plasma confinement device having a first set of magnets to confine the plasma in radial and axial directions within the plasma generation chamber and a second set of magnets to facilitate formation of a plasma meniscus at an extraction end of the plasma generation chamber; and a beam extraction chamber comprises:
a plasma electrode configured to receive ions from the plasma genera ton chamber;a first Einzel lens configured to extract a focused ion beam from the confined plasma;a beam limiting slit disposed adjacent to the first Einzel lens to reduce a size of the extracted focused ion beam; and
second Einzel lens disposed adjacent to the beam limiting slit, configured to focus the extracted focused ion beam on a workpiece, wherein a beam spot formed on the workpiece by the focused ion beam has a diameter of about 10 microns to about 20 microns.