发明名称 SAMPLE PROCESSING APPARATUS
摘要 Disclosed is a sample processing apparatus, comprising: a first mechanism unit having a first operation range of movement and that carries out a first process on a container with a sample, the first operation range comprising an overlap region and a non-overlap region; a second mechanism unit having a second operation range of movement and that carries out a second process on the container after completion of the first process, the second operation range comprising the overlap region but not the non-overlap region; an operation detector that senses operation of the first mechanism unit; and a controller that causes the first mechanism unit to stop the first process and retreat from the overlap region and that causes the second mechanism unit to continue the second process upon detection of abnormality in the first mechanism unit based on the detection result by the operation detector.
申请公布号 US2016091519(A1) 申请公布日期 2016.03.31
申请号 US201514868850 申请日期 2015.09.29
申请人 SYSMEX CORPORATION 发明人 OHFUCHI Masashi;MATSUMOTO Yusuke
分类号 G01N35/10;G01N35/00;B25J9/16 主分类号 G01N35/10
代理机构 代理人
主权项 1. A sample processing apparatus, comprising: a first mechanism unit having a first operation range of movement and that carries out a first process on a container with a sample, the first operation range comprising an overlap region and a non-overlap region; a second mechanism unit having a second operation range of movement and that carries out a second process on the container after completion of the first process, the second operation range comprising the overlap region but not the non-overlap region; a detector that senses operation of the first mechanism unit; and a controller that causes the first mechanism unit to stop the first process and retreat from the overlap region and that causes the second mechanism unit to continue the second process upon detection of abnormality in the first mechanism unit by the detector.
地址 Kobe-shi JP