发明名称 SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATMENT METHOD FOR DISCHARGING TREATMENT SOLUTION FROM NOZZLE TO SUBSTRATE
摘要 An upper treatment solution nozzle discharges a treatment solution at a treatment position above a substrate. A reference image and a test image are cut out from an image captured after the upper treatment solution nozzle receives an instruction to start discharging the treatment solution. The test image is an image including an area of a surface of a substrate, in which a liquid flow of the treatment solution from the upper treatment solution nozzle is to be formed. The reference image is an image of an area of the surface of the substrate except for the area in which the liquid flow of the treatment solution from the upper treatment solution nozzle is to be formed. Through the comparison between the reference image and the test image, a discharge of the treatment solution from the upper treatment solution nozzle is determined.
申请公布号 US2016089688(A1) 申请公布日期 2016.03.31
申请号 US201514854235 申请日期 2015.09.15
申请人 SCREEN Holdings Co., Ltd. 发明人 UEMAE Shoji;KAWAGUCHI Tatsuhiko
分类号 B05C11/10;B05D1/02;B05B3/00 主分类号 B05C11/10
代理机构 代理人
主权项 1. A substrate treating apparatus that discharges a treatment solution to a substrate, comprising: a substrate holder that holds a substrate; a cup surrounding said substrate holder; a nozzle that discharges a treatment solution; a drive part that moves said nozzle between a treatment position above the substrate held on said substrate holder and a standby position outside said cup; an imaging part that images an imaging area including an area in which a liquid flow is to be formed when said nozzle discharges the treatment solution at said treatment position; an image acquiring part that cuts out a test image and a first reference image, from an image obtained by said imaging part imaging said imaging area after said nozzle receives an instruction to start discharging the treatment solution, said test image being an image including the area of the surface of the substrate held on the substrate holder in which said liquid flow is to be formed, said first reference image being an image of the surface of the substrate except for said area; and a determination part that compares said first reference image and said test image to determine a discharge of the treatment solution from said nozzle.
地址 Kyoto JP