METAL HARD MASK AND METHOD FOR PRODUCING SAME

摘要

This metal hard mask (103) for etching an etching object film (102) that is present on an object to be processed is formed of an amorphous alloy film that is formed by a thin film formation technique. It is preferable to use a physical deposition method as the thin film formation technique, and sputtering is suitable for the use among physical deposition methods. This metal hard mask (103) is obtained by forming an amorphous alloy film on the etching object film (102) by a thin film formation technique and patterning the amorphous alloy film.