发明名称 A Lithographic Apparatus and a Method of Manufacturing a Lithographic Apparatus.
摘要 A lithographic apparatus comprising: a channel (46) for the passage therethrough of a two phase flow, wherein the channel is formed within a block, the block being of a first material (100); a second material (160) between the first material and the channel, wherein the second material has a specific heat capacity higher than that of the first material; and a third material (90) between the second material and the channel, wherein the third material has a thermal conductivity higher than that of the second material.
申请公布号 NL2014773(A) 申请公布日期 2016.03.31
申请号 NL20152014773 申请日期 2015.05.07
申请人 ASML NETHERLANDS B.V. 发明人 ROGIER HENDRIKUS MAGDALENA CORTIE;CHRISTIANUS WILHELMUS JOHANNES BERENDSEN;ANDRE BERNARDUS JEUNINK;ADRIANUS HENDRIK KOEVOETS;JIM VINCENT OVERKAMP;SIEGFRIED ALEXANDER TROMP;VAN VUONG VY;DANIEL ELZA ROELAND AUDENAERDT
分类号 G03F7/20 主分类号 G03F7/20
代理机构 代理人
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